產品描述

Equipment introduction

Suitable for wafer process cleaning. With the rapid development of science and technology, the wafers are getting smaller and smaller, and the gaps are getting smaller and smaller. The nano-atomization nozzle is used with the matrix cleaning method, which can be used for different products, for high-pressure/atomization cleaning according to the spacing, and can also strengthen the block according to the needs of the process. cleaning ability.

 

Features